| 摘要 |
PROBLEM TO BE SOLVED: To reduce alignment unevenness of an alignment film by making an angle of deflection uniform on a light receiving surface of a substrate, when alignment processing is carried out by light irradiation. SOLUTION: When the alignment film is subjected to alignment processing, by irradiating a substrate where the alignment film is arranged with light emitted from an optical system, a table where the substrate having the arranged substrate is mounted is a correction table in such a shape that, for example, the surface where the substrate is mounted is convex or concave and polarization deviation of light irradiating the substrate is taken into consideration. COPYRIGHT: (C)2006,JPO&NCIPI
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