发明名称 |
A METHOD OF PLASMA ETCH ENDPOINT DETECTION USING A V-I PROBE DIAGNOSTICS |
摘要 |
A plasma processing control system including a V-I probe for effectively monitoring a plasma processing chamber, where the probe can provide electrical parameters in response to a radio frequency (RF) supply (e.g., about 2 MHz, about 27 MHz, or about 60 MHz), a processor coupled to and/or included with a commercially available probe product that can provide harmonics for each of the electrical parameters, and a controller coupled to the processor that can select one of the electrical parameters and one of the associated harmonics for endpoint detection for a plasma processing step is disclosed. The electrical parameters can include voltage, phase, and current and the plasma processing application can be dielectric etching. A system according to embodiments of the invention may be particularly suited for dielectric etching in a production environment. |
申请公布号 |
WO2005098091(A2) |
申请公布日期 |
2005.10.20 |
申请号 |
WO2005US11214 |
申请日期 |
2005.03.30 |
申请人 |
LAM RESEARCH CORPORATION;AVOYAN, ARMEN;DASSAPA, FRANCOIS CHANDRASEKAR;MCMILLIN, BRIAN |
发明人 |
AVOYAN, ARMEN;DASSAPA, FRANCOIS CHANDRASEKAR;MCMILLIN, BRIAN |
分类号 |
C23F1/00;H01J37/32;H01L21/311 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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