| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection technique by a charged particle beam capable of acquiring a potential contrast image of higher defect detection efficiency than that in the conventional art, by establishing a method for setting the condition where a charged condition of an inspected object is optimized, without depending on an experience of an operator. SOLUTION: This technique has a process for scanning an area on a substrate surface formed with a prescribed pattern with the primary charged particle beam to detect a secondary electron signal generated from the area, and for forming an image of the area based on the detected signal, and a process for forming a histogram based on the image. In the technique, all the processes are executed in every change in irradiation conditions of the charged particle beam, an inspection condition is determined as the optimum one when two or more of peaks are separated in the histogram, and inspection is carried out based on the image acquired under the condition. COPYRIGHT: (C)2006,JPO&NCIPI
|
