发明名称 METHOD AND APPARATUS FOR MEASURING REFRACTIVE INDEX DISTRIBUTION IN OPTICAL CRYSTAL WAFER
摘要 PROBLEM TO BE SOLVED: To measure the refractive index distribution or birefringence rate distribution of a plurality of principal axes in a sample by a precise and rapid method, without being affected by the interference by the front and the rear surfaces of a wafer and the distribution of the thickness of the wafer. SOLUTION: In a method for measuring the refractive index distribution and in a sample, having two facing main surfaces in which light can enter, at the first, second, and third inclination angles of a main surface perpendicular direction with respect to the optical axis, a first transmission wavefront when P polarization is allowed to coincide with the first principal axis; and a second transmission wavefront, when P polarization is made to coincide with a second principal axis orthogonally crossing the first principal axis are measured; and the refractive index distribution of the first, second, and third principal axis polarization are measured. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005292046(A) 申请公布日期 2005.10.20
申请号 JP20040110289 申请日期 2004.04.02
申请人 MITSUI CHEMICALS INC 发明人 SHICHIJO SHIRO
分类号 G01N21/41;G01N21/45;(IPC1-7):G01N21/41 主分类号 G01N21/41
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