| 摘要 |
PROBLEM TO BE SOLVED: To provide a material resistant to acid etching, particularly a material resistant to acid etching using concentrated hydrofluoric acid, for use in the frosting process for improving on the light extracting efficiency of a light emitting element, sufficiently resistant to acid and, concurrently, high in alkali-solubility. SOLUTION: The material resistant to acid etching has the repeating unit represented by formula (1). In formula (1), R<SP>1</SP>is a hydrogen atom or a methyl group, R<SP>3</SP>is a cyclic group selected from the group consisting of aliphatic cyclic groups and aromatic groups, and R<SP>4</SP>is a polar group. R<SP>2</SP>is represented by formula (2), and n is 0 or 1. In formula (2), R<SP>5</SP>is a hydrogen atom or a methyl group. COPYRIGHT: (C)2006,JPO&NCIPI
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