发明名称 HIGH BRIGHTNESS GALLIUM NITRIDE-BASED LIGHT EMITTING DIODE WITH TRANSPARENT CONDUCTING OXIDE SPREADING LAYER
摘要 A new transparent conducting oxide (TCO), which can be expressed as Al<SUB>x</SUB>Ga<SUB>3-x-y</SUB>In<SUB>5+y</SUB>Sn<SUB>2-z</SUB>O<SUB>16-2z</SUB>; 0<=x<1, 0<y<3, 0<=z<2, has been used to improve the brightness and current spreading in GaN base LED process. The optical properties of this system are superior to regular Ni/Au transparent conducting layer in blue-green region, and the new Al<SUB>2</SUB>O<SUB>3</SUB>-Ga<SUB>2</SUB>O<SUB>3</SUB>-In<SUB>2</SUB>O<SUB>3</SUB>-SnO<SUB>2 </SUB>system is able to increase the brightness at 1.5~2.5 time to compare to regular process. Furthermore, the new transparent conducting oxide thin film has the highest conductivity, which is better than the Ni/Au transparent conducting thin film.
申请公布号 US2005230701(A1) 申请公布日期 2005.10.20
申请号 US20040825290 申请日期 2004.04.16
申请人 HUANG WEN-CHIEH 发明人 HUANG WEN-CHIEH
分类号 H01L31/109;H01L33/14;H01L33/32;H01L33/42;(IPC1-7):H01L31/109 主分类号 H01L31/109
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