发明名称 Intensifying pulsed magnetron discharge in a vacuum chamber comprises deflecting an additional electron stream from an additional electron source to a first electrode so that ions are formed in the region of the electrode
摘要 <p>Intensifying a pulsed magnetron discharge in a vacuum chamber (3) comprises deflecting an additional electron stream from an additional electron source (9) to a first electrode (1) for a part of each time period, in which the first electrode is operated non cathodically, so that ions are formed in the region of the first electrode. An independent claim is also included for a device for operating a pulsed magnetron discharge in a vacuum chamber. Preferred Features: The first electrode alternates as a cathode or anode. A hollow cathode is used as the additional electron source. A thin layer is formed on a substrate using magnetron sputtering.</p>
申请公布号 DE102004015230(A1) 申请公布日期 2005.10.20
申请号 DE20041015230 申请日期 2004.03.29
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 FIETZKE, FRED;KLOSTERMANN, HEIDRUN;GOEDICKE, KLAUS;KIRCHHOFF, VOLKER;WUENSCHE, TILO;BOECHER, BERND-GEORG
分类号 C23C14/35;C23C14/54;(IPC1-7):C23C14/35 主分类号 C23C14/35
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