发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device having a through electrode excellent in performance and manufacture stability as an electrode. <P>SOLUTION: The through electrode 135 which is constituted of a conductive small diameter plug 119 and a conductive large diameter plug 131 is arranged on the semiconductor device 100. Cross section of the small diameter plug 119 is made greater than cross section and diameter of a connection plug 123 and smaller than cross section and diameter of the large diameter plug 131, respectively. A projection 141 wherein the small diameter plug 119 is projected from a silicon substrate 101 is inserted into an upper surface of the large diameter plug 131. An upper surface of the small diameter plug 119 is connected to a first wiring 121. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294577(A) 申请公布日期 2005.10.20
申请号 JP20040108304 申请日期 2004.03.31
申请人 NEC ELECTRONICS CORP 发明人 KAWANO MASAYA
分类号 H01L23/52;H01L21/28;H01L21/3205;H01L21/44;H01L21/60;H01L21/768;H01L21/8242;H01L23/48;H01L29/40 主分类号 H01L23/52
代理机构 代理人
主权项
地址