发明名称 PLASMA VAPOR DEPOSITION APPARATUS, AND PLASMA VAPOR DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma vapor deposition apparatus, and a plasma vapor deposition method in which a vapor-deposited film having excellent performance can be formed in the same chamber for any bottle of various kinds of shapes and capacities, the cost can be reduced, and the working efficiency and the productivity can be enhanced. <P>SOLUTION: An attachable/detachable core member 12 is mounted on an inner side face 11 of a chamber 10 of the plasma vapor deposition apparatus 1. The core member 12 of an adequate shape is selected according to the shape and the capacity of the bottle 20 to be vapor-deposited, and mounted on the inner side face 11 of the chamber. In addition, a plurality of core members 12 can be mounted on the inner side face 11 of the chamber according to the shape or the like of the bottle 20. In the case of the bottle 20 of a small capacity, the core members can be mounted on the entire inner side face 11 of the chamber. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005290507(A) 申请公布日期 2005.10.20
申请号 JP20040109663 申请日期 2004.04.02
申请人 TOYO SEIKAN KAISHA LTD 发明人 KOBAYASHI AKIRA;YAMADA KOJI;AIHARA TAKESHI;KURASHIMA HIDEO
分类号 H05H1/46;B65D1/00;B65D1/09;B65D23/08;B65D25/34;C23C16/44;C23C16/505;C23C16/511 主分类号 H05H1/46
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