发明名称 Semiconductor wafer used in microelectronics comprises a mechanical getter, an oxide layer and a polycrystalline layer on its rear side
摘要 <p>Semiconductor wafer comprises a mechanical getter, an oxide layer and a polycrystalline layer on its rear side. The oxide and polycrystalline layers extend up to an edge region of the wafer and cover this edge region. An independent claim is also included for: a process for the production of the semiconductor wafer.</p>
申请公布号 DE102005024072(A1) 申请公布日期 2005.10.20
申请号 DE20051024072 申请日期 2005.05.25
申请人 SILTRONIC AG 发明人 KRASNY, HARALD
分类号 C30B29/06;C30B33/00;H01L21/302;H01L21/322;H01L29/02;(IPC1-7):H01L21/302 主分类号 C30B29/06
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