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发明名称
METHODS AND APPARATUS FOR REMOVING PHOTORESIST MASK DEFECTS IN A PLASMA REACTOR
摘要
申请公布号
KR100523365(B1)
申请公布日期
2005.10.20
申请号
KR19997008069
申请日期
1999.09.06
申请人
发明人
分类号
H01L21/306;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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