| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device capable of safely forming a film with simple device constitution by using widely ranging raw materials for film formation. SOLUTION: A local film formation 40 has a target arrangement 60 supporting a target 50 made of a raw material for film formation. Pulse laser light PLB 1 from a 1st light source 30 is guided by a 1st optical system 70 to irradiate the target 50. The raw material for film formation vaporizes from the target 50 to form a repair film 12 at a desired position on a TFT array substrate 10 on a mount base 20. Even a raw material for film formation such as aluminum and copper whose film were formed in a vacuum chamber by a conventional laser CVD method because of safety against raw material gas can be made into a film safety without the vacuum chamber, and various metal single bodies or alloys, metal oxides, and metal nitrides can be selected as raw materials film formation over a wide range. COPYRIGHT: (C)2006,JPO&NCIPI
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