发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor light emitting device capable of forming end surface window structure by Zn solid phase diffusion which can be performed in low temperature and short time, furthermore is independent of thickness. SOLUTION: The manufacturing method of the semiconductor light emitting device comprises a process of selectively depositing a ZnO film 13b in a portion with respect to a location adjacent to a resonator end surface of a layered product having at least a first and a second conductive type cladding layers in such a manner that they sandwich active layers 6, and a process of forming a window structure 15 by performing a thermal diffusion treatment in a diffusion temperature of 600°C or less and 450°C or more, and a diffusion time of 20 minute or less and 3 minute or more, furthermore by diffusing Zn of the above-mentioned ZnO film 13b inside the above-mentioned layered product in solid phase diffusion. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294748(A) 申请公布日期 2005.10.20
申请号 JP20040111224 申请日期 2004.04.05
申请人 SONY CORP 发明人 KIJIMA SATORU
分类号 H01S5/16;(IPC1-7):H01S5/16 主分类号 H01S5/16
代理机构 代理人
主权项
地址