发明名称 METHOD OF MEASURING DOUBLE REFRACTION PLATE BY ELLIPTICALLY POLARIZED LIGHT INCIDENCE
摘要 PROBLEM TO BE SOLVED: To provide a method of measuring a directional angleψand an absolute relative phase differenceρ<SB>tol</SB>in a double refraction plate due to elliptically polarized light incidence. SOLUTION: The absolute relative phase differenceρ<SB>tol</SB>is measured by comparing a measured intensity with that in a calibration table measured preliminarily, in a conventional measuring method using the elliptically polarized light incidence. The present invention measures emission light from the double refraction plate due to the elliptically polarized light incidence by a method according to the mathematical expression 2, using an analyzer system constituted of a 1/4 wavelength plate Q<SB>2</SB>and a polarizer P<SB>2</SB>. A phase error in the 1/4 wavelength plate Q<SB>2</SB>due to an optional wavelength of incident light is subjugated thereby. The directional angleψand the relative phase differenceρare obtained thereby respectively according to the mathematical expression 3 and the mathematical expression 4, when an ellipticity angleεand a directional angleθof the elliptically polarized light is known, and the optional directional angleψand the absolute relative phaseρ<SB>tol</SB>therein are obtained by phase-coupling those. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005292028(A) 申请公布日期 2005.10.20
申请号 JP20040109921 申请日期 2004.04.02
申请人 KIHARA TOSHIYOSHI;UNIV KINKI 发明人 KIHARA TOSHIYOSHI
分类号 G01B11/16;(IPC1-7):G01B11/16 主分类号 G01B11/16
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