发明名称 |
Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method |
摘要 |
A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.
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申请公布号 |
US2005231043(A1) |
申请公布日期 |
2005.10.20 |
申请号 |
US20040825224 |
申请日期 |
2004.04.16 |
申请人 |
ASML NETHEDRLANDS B.V. |
发明人 |
VERMEULEN JOHANNES PETRUS MARTINUS B.;JANSSEN HENRICUS WILHELMUS A.;LOOPSTRA ERIK R. |
分类号 |
G03F7/20;H01L21/027;H01L21/68;H02K3/04;H02K41/00;H02K41/03;(IPC1-7):H02K41/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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