发明名称 Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method
摘要 A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.
申请公布号 US2005231043(A1) 申请公布日期 2005.10.20
申请号 US20040825224 申请日期 2004.04.16
申请人 ASML NETHEDRLANDS B.V. 发明人 VERMEULEN JOHANNES PETRUS MARTINUS B.;JANSSEN HENRICUS WILHELMUS A.;LOOPSTRA ERIK R.
分类号 G03F7/20;H01L21/027;H01L21/68;H02K3/04;H02K41/00;H02K41/03;(IPC1-7):H02K41/00 主分类号 G03F7/20
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