发明名称 Method to prevent static destruction of an active element comprised in a liquid crystal display device
摘要 A liquid crystal display device which utilizes an active matrix substrate and its substrate, and which is provided with a novel method of manufacture which can reduce the manufacturing process of amorphous silicon thin film transistors of reverse stagger construction, and an electrostatic protection means which is created using this method of manufacture. In a thin film transistor manufacturing process, along with forming an aperture for connecting the contact hole and the external terminal in a manufacturing process for a thin film transistor, utilization is made of ITO film as the wiring. The electrostatic protection means is formed from a bidirectional diode (electrostatic protection element) which is composed utilizing an MOS transistor connected between the electrode (PAD) for connecting the external terminal, and the joint electric potential line. The electrostatic protection element is substantially a transistor, with great current capacity, and utilizing the TFT formation process of pixel components in their existent state, the process can be formed without any complications.
申请公布号 US2005233509(A1) 申请公布日期 2005.10.20
申请号 US20030458803 申请日期 2003.06.11
申请人 SEIKO EPSON CORPORATION 发明人 SATOU TAKASHI
分类号 G02F1/1362;H01L27/02;(IPC1-7):H01L21/84;H01L21/476 主分类号 G02F1/1362
代理机构 代理人
主权项
地址