| 摘要 |
A mask with an opening pattern is placed on a substrate, and etching is carried out by use of anisotropy etching of crystal. The opening pattern of the mask is composed of broken lines, each of which is discontinued by discontinuing portions. By the etching, a birefringence optical element with a fine structure, in which trenches, each of which is discontinued by discontinuing portions, are juxtaposed periodically at a specified pitch, is obtained.
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