发明名称 COATING AND DEVELOPING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a coating and developing device which calculates a first time period (PCD time period), etc. from completion of the coating process of a resist by a coating unit to start of a heating process by a first heating unit in a subsequent process, without processing a substrate actually, and can predict variations of a circuit line width, etc. SOLUTION: When an operator prepares a conveyance recipe, the PCD time period, a second time period (PAD time period) from completion of the first heating process by the first heating unit to start of an exposure process by an exposure system in a subsequent process, and a third time period (PED time period) from completion of the exposure process by the exposure system to start of a second heating process by a second heating unit are predicted and calculated based on this conveyance recipe, for display. The PCD time period, etc. can be figured out without actually processing the substrate by the coating and developing device, whereby variations of the circuit line width, etc. can be predicted. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294460(A) 申请公布日期 2005.10.20
申请号 JP20040106132 申请日期 2004.03.31
申请人 TOKYO ELECTRON LTD 发明人 AZUMA MAKIO;MIYATA AKIRA
分类号 B05C11/08;C23C16/00;H01L21/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 B05C11/08
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