发明名称 Method of manufacturing spin valve film
摘要 During a process of manufacturing a spin valve film which produces a large read out signal upon being used as a reading element of a thin film magnetic head, after a completion of a film making process for forming a previous film of two films to be formed successively, but before an initiation of a film making process for forming a succeeding film of the two films, a step of decreasing an anisotropic magnetic field of the spin valve film by interrupting a film making process is introduced. The anisotropic magnetic field reducing step may be performed by keeping a substrate within a sputtering vacuum chamber. A period of the interruption can be shortened by exposing the substrate to a plasma, by transferring the substrate in a separate vacuum chamber whose degree of vacuum is lower than that of the sputtering vacuum chamber or whose H<SUB>2</SUB>O or O<SUB>2 </SUB>concentration is higher than that in the sputtering vacuum chamber, by conducting a surface treatment with a gas containing H<SUB>2</SUB>O or O<SUB>2 </SUB>by not less than 1 ppm, or by flowing a process gas.
申请公布号 US2005231857(A1) 申请公布日期 2005.10.20
申请号 US20050121929 申请日期 2005.05.05
申请人 TDK CORPORATION 发明人 AMANO HAJIME;TAKEZUTSUMI HIROAKI;SASAKI TETSURO;SATO JUN-ICHI
分类号 G11B5/31;G11B5/39;H01F10/32;H01F41/18;H01F41/30;H01L43/08;H01L43/12;(IPC1-7):G11B5/127 主分类号 G11B5/31
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