发明名称 |
Brush positioning device for a wafer cleaning station |
摘要 |
A method, device, and system for positioning a brush of a wafer cleaning system. In the method, device, and system one or more light sources are positioned to generate one or more light beams across a plane. One or more light detectors are positioned to detect when the light beams are interrupted by the brush as it advances toward the plane.
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申请公布号 |
US2005229950(A1) |
申请公布日期 |
2005.10.20 |
申请号 |
US20040823955 |
申请日期 |
2004.04.14 |
申请人 |
CHOU MING-CHUN;PETERSEN BRIAN W |
发明人 |
CHOU MING-CHUN;PETERSEN BRIAN W. |
分类号 |
B08B1/00;B08B1/04;B08B7/00;C23G1/00;H01L21/00;H01L21/68;(IPC1-7):C23G1/00 |
主分类号 |
B08B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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