发明名称 Method for purification of lens gases used in photolithography
摘要 A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.
申请公布号 US2005229783(A1) 申请公布日期 2005.10.20
申请号 US20050147563 申请日期 2005.06.08
申请人 MYKROLIS CORPORATION 发明人 ALVAREZ DANIEL JR.;SPIEGELMAN JEFFREY J.
分类号 B01D53/02;B01D53/04;B01D53/26;B01D53/50;B01D53/56;B01D53/72;B01J20/02;B01J20/06;B01J20/18;G03F7/20;(IPC1-7):B01D53/02 主分类号 B01D53/02
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