发明名称 |
ELECTRON BEAM LITHOGRAPHY SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To strengthen a rigidity of a jointing part between an electron optical tube and a sample chamber. SOLUTION: A flange face of the electron optical tube is widened and jointed by two row bolts to apply a high contact surface pressure. Further, a thin soft-metal material is inserted between the flange face of the electron optical tube and a mounting surface in the sample chamber to strengthen the rigidity of the jointing part. This improves a fixing rigidity of the electron optical tube to the sample chamber to improve a shake-proof, which lowers a shift in position at the time of lithography. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005294712(A) |
申请公布日期 |
2005.10.20 |
申请号 |
JP20040110647 |
申请日期 |
2004.04.05 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TSUJI HIROSHI;HAYATA YASUNARI;FUKUSHIMA YOSHIMASA |
分类号 |
G03F7/20;F16B7/18;F16B9/02;F16B39/14;H01J37/16;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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