发明名称 |
METHOD FOR PROCESSING LITHOGRAPHIC PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a plate making processing method by which the excellent printing resistance of a lithographic printing plate and the excellent ink attaching properties can be realized. SOLUTION: A photo-sensitive layer is provided on an aluminum support in the method for processing a lithographic printing plate. The plate face is processed with an aqueous solution including≥0.5% of an inorganic cation having a bivalence or more after development treatment. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005288843(A) |
申请公布日期 |
2005.10.20 |
申请号 |
JP20040106307 |
申请日期 |
2004.03.31 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
SEIYAMA HIDEO |
分类号 |
B41N3/08;(IPC1-7):B41N3/08 |
主分类号 |
B41N3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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