发明名称 |
EQUIPMENT AND METHOD FOR PROCESSING SEMICONDUCTOR |
摘要 |
<p>Semiconductor processing equipment includes a transfer chamber (3) having a plurality of transfer ports (33) arranged at different positions in a lateral direction. A process chamber (4A) for performing a semiconductor process to a substrate (W) to be processed is connected with the transfer chamber (3) through one of the transfer ports. A transfer arm device (5) is arranged in the transfer chamber (3) so as to transfer the substrate (W) through a plurality of the transfer ports (33). A drive mechanism (55) is arranged so as to extend and retract the transfer arm device (5) and to turn it in a vertical axis direction. Inclination adjusting mechanisms (6A-6C) are arranged so as to adjust the inclination of the transfer arm device (5).</p> |
申请公布号 |
WO2005098934(A1) |
申请公布日期 |
2005.10.20 |
申请号 |
WO2005JP03035 |
申请日期 |
2005.02.24 |
申请人 |
TOKYO ELECTRON LIMITED;HIROKI, TSUTOMU |
发明人 |
HIROKI, TSUTOMU |
分类号 |
H01L21/00;H01L21/677;H01L21/68;B25J9/06;B25J9/00;B25J9/04;B25J13/08;B65G49/07;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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