发明名称 |
Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads |
摘要 |
A method for forming a bi-layer lift-off mask for use in fabricating GMR read-head sensors with trackwidths of less than 0.1 microns. The mask layers are formed symmetrically on each other, each layer of the mask having a novel dog-bone shape and the lower mask layer being substantially undercut relative to the upper mask layer. The central portion of the lower mask layer forms a narrow ridge that maintains the upper mask layer at a fixed height above a substrate, thereby avoiding problems associated with bi-layer lift-off masks of the prior art. The method of forming the lower ridge requires a carefully controlled undercutting of the lower mask layer, which is accomplished by using an ozone-assisted oxidation process.
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申请公布号 |
US2005233258(A1) |
申请公布日期 |
2005.10.20 |
申请号 |
US20040827949 |
申请日期 |
2004.04.20 |
申请人 |
HEADWAY TECHNOLOGIES, INC.&TDK CORPORATION |
发明人 |
CHEN CHAO-PENG;KAJI RINA;CHANG JEI-WEI |
分类号 |
G03F7/00;G11B5/31;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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