| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a surface acoustic wave element which facilitates manufacturing an electrode pattern at a high size accuracy. <P>SOLUTION: The method of manufacturing a surface acoustic wave element 22 uses an LT substrate 10 having a reflectance of 10% or less of an i-beam at its mirror surface polishing, resulting in that the most of the i-beam radiated at exposure is absorbed into the substrate 10. This significantly reduces the reflection of the i-beam radiated at exposure on the substrate backside 10b, and hence an electrode pattern 20 having a high size accuracy is formed without forming an antireflective film on the substrate surface 10a at the exposure side of the substrate 10. According to the method of manufacturing the surface acoustic wave element 22, the electrode pattern 20 having a high size accuracy is easily manufactured, compared with the conventional manufacturing method needing a deposition processing of an antireflective film, taking a much labor and time. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
