| 发明名称 |
System and method for forming multi-component dielectric films |
| 摘要 |
The present invention provides systems and methods for mixing precursors such that a mixture of precursors are present together in a chamber during a single pulse step in an atomic layer deposition (ALD) process to form a multi-component film. The precursors are comprised of at least one different chemical component, and such different components will form a mono-layer to produce a multi-component film. In a further aspect of the present invention, a dielectric film having a composition gradient is provided.
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| 申请公布号 |
US2005233156(A1) |
申请公布日期 |
2005.10.20 |
| 申请号 |
US20050166258 |
申请日期 |
2005.06.24 |
| 申请人 |
AVIZA TECHNOLOGY, INC. |
发明人 |
SENZAKI YOSHIHIDE;PARK SEUNG G. |
| 分类号 |
C23C16/02;C23C16/30;C23C16/40;C23C16/44;C23C16/455;H01L21/314;H01L21/316;(IPC1-7):B32B9/04;B32B13/04;H01L21/31;H01L21/469 |
主分类号 |
C23C16/02 |
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