RESIST POLYMER AND RESIST COMPOSITION

摘要

A resist polymer containing a specific constitutional unit having a cyano group, a constitutional unit having an acid-cleavable group and a specific constitutional unit having a lactone skeleton is disclosed. When used as a resist resin in DUV excimer laser lithography or electron beam lithography, this resist polymer exhibits high sensitivity and high resolution and forms a resist pattern of good shape. Using this resist polymer, occurrence of line-edge roughness and formation of microgel are suppressed.