| 摘要 |
In a step for jetting removal liquid onto rotating substrates (W) and distributing the liquid thereon among processes for performing polymer removal treatment by a substrate treatment device (3), data on substrate rotational speed, removal liquid temperature, removal liquid flow rate, and removal liquid jetting time is collected and, based on the combination thereof, the comprehensive determination is made to detect a treatment abnormality. In a pure water jetting step, data on substrate rotational speed, pure water flow rate, and pure water jetting time is collected and, based on the combination thereof, the comprehensive determination is made to detect a treatment abnormality. Namely, the treatment abnormalities can be detected with higher accuracy by comprehensively detecting the treatment abnormality of the polymer removal treatment based on the combination of important control elements in important steps largely affecting the results of the treatment.
|
