发明名称 |
Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus |
摘要 |
A light energy inspecting apparatus provides an optimum exposure condition in photolithographic apparatus by sensing the energy levels of light passing through the aperture of a diaphragm. The light energy inspecting apparatus includes a photoelectric transformation unit, a drive mechanism for the photoelectric transformation unit, and a controller. The photoelectric transformation unit is made up of a plurality of photoelectric transformation devices (PTDs) which can each sense the level of energy of incident light and convert the incident light to a corresponding electric signal. The drive mechanism positions the photoelectric transformation unit relative to the diaphragm.
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申请公布号 |
US6956640(B2) |
申请公布日期 |
2005.10.18 |
申请号 |
US20030655309 |
申请日期 |
2003.09.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE BYEONG-CHEOL |
分类号 |
G03F7/20;G03B27/54;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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