发明名称 |
Charged particle beam apparatus and charged particle beam irradiation method |
摘要 |
A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
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申请公布号 |
US6956211(B2) |
申请公布日期 |
2005.10.18 |
申请号 |
US20030656166 |
申请日期 |
2003.09.08 |
申请人 |
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发明人 |
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分类号 |
G01Q20/02;G01Q30/02;H01J3/14;H01J29/70;H01J37/153;H01J37/28;(IPC1-7):H01J29/70 |
主分类号 |
G01Q20/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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