PHOTOMASK, PHOTOMASK PRODUCTION METHOD AND ELECTRONIC PARTS PRODUCTION METHOD

摘要

A photomask comprises a substrate, a translucent film selectively formed on the substrate, and a shading film selectively formed on the translucent film, wherein when the substrate, the translucent film and the shading film have Young's moduli (MPa) E₀ E₁ and E₂, and film thickness (m) d₀, d₁ and d₂ respectively, internal stresses (MPa) of the translucent film and the shading film at room temperature are s₁ and s₂ respectively, a covering rate by the translucent film defined by an area in which the shading film is not formed is expressed as h, and coefficients are expressed as k₁=1.3x10^-8, k₂=-9.5x10^-2, k₃=6.0x10^-7, and k₄=-5.2x10^-2 respectively, the substrate, the translucent film and the shading film satisfy a condition given by the following expression: $\frac{1}{E_0.d_0}.\left\{h.\left(k_1.\frac{S_1}{E_1.d_1}+k_2\right)+\left(k_3.\frac{S_2}{E_2.d_2}+k_4\right)\right\}<=1.4x{10}^{-4}\left(m^{-1}\right).$