ATOMIC LAYER DEPOSITION METHOD USING PLASMA,申请号KR20040024946-传众专利搜索

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发明名称	ATOMIC LAYER DEPOSITION METHOD USING PLASMA
摘要
申请公布号	KR20050099763(A)	申请公布日期	2005.10.17
申请号	KR20040024946	申请日期	2004.04.12
申请人	IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)	发明人	CHEON, HYUND TAK;KIM, JU YOUN
分类号	C23C16/44;(IPC1-7):C23C16/44	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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