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发明名称
Acid-modified Novolak Resin, manufacturing method thereof and positive photoresist composition containing the same
摘要
申请公布号
KR100521421(B1)
申请公布日期
2005.10.14
申请号
KR20030065367
申请日期
2003.09.20
申请人
发明人
分类号
C08F14/04;(IPC1-7):C08F14/04
主分类号
C08F14/04
代理机构
代理人
主权项
地址
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