发明名称 |
Dicopper(I)oxalate complexes for use as precursor substances in metallic copper deposition |
摘要 |
The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis base components and to the use thereof as precursors for the deposition of metallic copper. The neutral Lewis bases used are alkynes or alkenes containing at least one silyl or ester group, or nitrites, saturated or unsaturated nitrogen ligands, phosphites, trialkyl-phosphines or oxygen- or sulfur-containing ligands.
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申请公布号 |
US2005226997(A1) |
申请公布日期 |
2005.10.13 |
申请号 |
US20040519163 |
申请日期 |
2004.12.23 |
申请人 |
KOEHLER KATRIN;MEYER FRANC |
发明人 |
KOEHLER KATRIN;MEYER FRANC |
分类号 |
C07C55/07;C07C51/41;C07F1/08;C07F7/08;C23C16/18;H05K3/10;(IPC1-7):C07F1/08;B05D5/12 |
主分类号 |
C07C55/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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