| 摘要 |
PROBLEM TO BE SOLVED: To provide a sealing structure where oxidized dust during formation of a semiconductor film is not collected on the clean space side K and workability of mounting on a dovetail groove is excellent, and an elastic seal keeping an always stable and clean posture in the dovetail groove is provided. SOLUTION: The sealing structure comprises the elastic seal 1, a member 2 to be mounted having the dovetail groove 3, and a mating member 21. The elastic seal 1 is formed in a bilaterally asymmetrical shape in regard to a central line L, a high shoulder 12H is present on the clean space side K, and a middle shoulder 12L is present on the atmosphere side M. The elastic seal 1 is provided with a straight tilt surface 14 having a predetermined tilt angle extending from the middle shoulder part 12L to an arc shaped top surface 10 of a protrusion 9, and a space G having a predetermined width is formed between the elastic seal 1 and a side wall surface 6 of the dovetail groove 3. COPYRIGHT: (C)2006,JPO&NCIPI
|
