| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment system capable of avoiding stopping of a semiconductor manufacturing device by temporary stopping of an exhaust gas treatment device and realizing high productivity and low cost, an exhaust gas treatment method and an exhaust gas treatment control system. <P>SOLUTION: The exhaust gas treatment system is provided with a means 2b for unifying the exhaust gas discharged from a plurality of semiconductor manufacturing devices 1; a means 2c for distributing the unified exhaust gas to a plurality of gases; means 4, 5, 6 for controlling the distributed flow rates of the exhaust gases, respectively; and a plurality of exhaust gas treatment means 3 for introducing and treating the exhaust gases the flow rates of which are controlled, respectively. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
