| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner which enables exposure with high throughput, while maintaining the purity of the gas inside the atmosphere. <P>SOLUTION: The aligner is an aligner which uses an excimer laser as a light source. The aligner includes first and second chambers that are disposed along the path of the excimer laser, in this order, and keeps the path under a predetermined gaseous atmosphere, and an optical member that spatially separates the first chamber and the second chamber, as well as transmits the excimer laser, the optical member includes fluorine compound glass. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
