发明名称 SEMICONDUCTOR DEVICE, ITS MANUFACTURING METHOD, AND ELECTRO-OPTICAL DEVICE CONTAINING THE SAME AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device in which the lower side shading film of a thin-film transistor is formed as a film which is superior in low resistance and light-shielding properties. <P>SOLUTION: The semiconductor device comprises a gate electrode of the thin-film transistor provided on a substrate; a semiconductor film, serving as an active layer of the thin-film transistor provided between the substrate and the gate electrode; a source electrode and a drain electrode of the thin-film transistor connected to a semiconductor film, and the lower side shading film which is formed as a lamination film, containing a first film to be composed by using a material containing aluminium; and a second film to be composed by using a material containing titanium and also is provided between the substrate and the active layer. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005285976(A) 申请公布日期 2005.10.13
申请号 JP20040095624 申请日期 2004.03.29
申请人 SEIKO EPSON CORP 发明人 SERA HIROSHI
分类号 G02F1/1335;G02F1/1368;G09F9/30;H01L29/786 主分类号 G02F1/1335
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