| 摘要 |
PROBLEM TO BE SOLVED: To provide a film depositing apparatus capable of obtaining an objective film pattern with high accuracy even when a mask member to be used is large in size. SOLUTION: The film depositing apparatus 10 has a mask body part 10 having a base member 12 having an aperture 15 and a mask member 13 which is arranged at the position to cover the aperture 15 above the base member 12 and provided with a mask opening part 14 of a predetermined pattern, and has a supporting means 17 to support at least a part of a non-opening part of the base member 12 from the base member 12 side with respect to the mask body part 10. COPYRIGHT: (C)2006,JPO&NCIPI
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