| 摘要 |
PROBLEM TO BE SOLVED: To provide a molecular beam source for depositing an organic thin film in which a uniform thin film can be deposited on a film deposition surface of a large substrate, any film deposition material is not deposited on a molecule-emitting hole of the film deposition material, or the emission-emitting hole is hardly narrowed or clogged thereby. SOLUTION: In the molecule beam source for depositing an organic thin film, a valve 33 is disposed in a space reaching a molecule-emitting hole 14 to emit molecules of a film deposition material generated from a molecule heating unit 12 side toward a film deposition surface, and heaters 18, 19 to heat the molecules to be emitted out of the film deposition material are provided on the molecule-emitting hole 14 side. An outer guide 13 having a tapered guide wall and an inner guide 16 which is provided on the inner side of the outer guide and has a tapered guide wall are provided on the molecule-emitting hole 14 side. A molecule-emitting passage 17 is formed between the outer guide 13 and the inner guide 16 so that the diameter is gradually increased toward the molecule-emitting direction. The heaters 18, 19 are provided on the outer guide 13 and the inner guide 16, respectively, and a heater 20 is provided so as to pass through the molecule-emitting hole 14. COPYRIGHT: (C)2006,JPO&NCIPI
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