| 摘要 |
<p>[PROBLEMS] To reduce a superimpose error after exposure without using a plenty of time or cost. [MEANS FOR SOLVING PROBLEMS] An alignment condition decision device includes: an acquisition unit (610) for performing position measurement for a measurement point set for each arbitrary shot via photoelectric detection and statistical calculation based on the measurement position and the design position of the measurement point, so as to acquire a reference calculation result; an acquisition unit (640) for positioning each shot at a predetermined exposure position according to the reference calculation result before exposing the shot, and acquiring a reference machining result obtained by measuring the superimpose error for the shot; an acquisition unit (620) for performing the position measurement of the measurement point set for each arbitrary shot and statistical calculation based on the measurement position and the design position of the measurement point, while modifying at least a part of predetermined alignment conditions so as to obtain a comparison calculation result; and a control unit (650) for using the reference calculation result, the comparison calculation result, and the reference machining result so as to calculate a superimpose error estimated when it is assumed that the shot is positioned at the predetermined exposure position according to the comparison calculation result and subjected to exposure.</p> |
