| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion type aligner which realizes high-grade exposure by facilitating liquid control and reducing dissolution of impurities into liquid. <P>SOLUTION: The aligner has a projection optical system which projects a pattern of a reticle to an exposure body and exposes the exposure body via liquid between a lens disposed at the closest side to the exposure body of the optical system and the exposure body. The surface in the exposure body side of the lens is smaller than an effective region in the surface in the reticle side of the lens. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
