| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device and a plasma treatment method capable of increasing the power supply to an electric path in which plasma is generated. <P>SOLUTION: The plasma treatment device comprises a gas supply unit to supply reaction gas to the opposing position of a drum-shaped rotary electrode 5 to a dielectric base material 3 when the dielectric base material 3 is arranged between the drum-shaped rotary electrode 5 and a base material carrying table 2 (electrode) arranged opposite to each other, a high frequency power source 7 to generate plasma at the opposing position of the drum-shaped rotary electrode 5 to the dielectric base material 3 through the plasma discharge by supplying the high frequency power to the drum-shaped rotary electrode 5, and an impedance regulation unit 4 in which the inductive reactance with substantially equivalent in absolute value to the reactance component between the drum-shaped rotary electrode 5 with plasma generated therein and the base material carrying table 2 is generated in the supply path of the high frequency power by the high frequency power source 7. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
