PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY

摘要

A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA > 0.85 and a demagnifying imaging scale where ||b|| < 0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.