| 摘要 |
Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include a quaternary ammonium salt, preferably a quaternary ammonium halide, borate, sulfonate, tosylate or carbonate. Compositions for carrying out the methods are also described. The quaternary ammonium salts preferably contain at least one CO<SUB>2</SUB>-philic group, such as a siloxane-containing group or a fluorine-containing group.
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