发明名称 High luminance indium gallium aluminum nitride light emitting device and manufacture method thereof
摘要 A high luminance indium gallium aluminum nitride light emitting diode (LED) is disclosed, including a substrate, a first conductive type nitride layer, an active layer, a second conductive type nitride layer, a first contact layer, a second contact layer, and a conductive transparent layer. The first contact layer has a first bandgap and a first doping concentration, and is disposed on the second conductive type nitride layer. The second contact layer has a second bandgap and a second doping concentration, and is disposed on the first contact layer. The first doping concentration and the second doping concentration are respectively larger than a predetermined concentration, and the first bandgap is smaller than the second bandgap. The second contact layer is thinner than a predetermined thickness so that a tunneling effect occurs between the conductive transparent layer and the second contact layer while the LED is in operation.
申请公布号 US2005224832(A1) 申请公布日期 2005.10.13
申请号 US20040953983 申请日期 2004.09.28
申请人 WU JEN-CHAU;TU CHUNG-CHENG;HUANG PAO-I 发明人 WU JEN-CHAU;TU CHUNG-CHENG;HUANG PAO-I
分类号 H01L21/28;H01L33/14;H01L33/32;(IPC1-7):H01L33/00 主分类号 H01L21/28
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