发明名称 CMP PAD WITH COMPOSITE TRANSPARENT WINDOW
摘要 The invention is directed to chemical-mechanical polishing pads comprising a transparent window. In one embodiment, the transparent window comprises an inorganic material and an organic material, wherein the inorganic material comprises 20 wt.% or more of the transparent window. In another embodiment, the transparent window comprises an inorganic material and an organic material, wherein the inorganic material is dispersed throughout the organic material and has a dimension of 5 to 1000 nm, and wherein the transparent window has a total light transmittance of 30 % or more at at least one wavelength in the range of 200 to 10,000 nm. In yet another embodiment, the transparent window comprises an inorganic/organic hybrid sol-gel material. In an additional embodiment, the transparent window comprises a polymer resin and a clarifying material, wherein the transparent window has a total light transmittance that is substantially higher than a window comprising only the polymeric resin.
申请公布号 KR20050099541(A) 申请公布日期 2005.10.13
申请号 KR20057014627 申请日期 2005.08.09
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 PRASAD ABANESHWAR
分类号 B24B37/20;B24D3/34;B24D13/14 主分类号 B24B37/20
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