| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize plasma production having high plasma space volume ratio over a plasma reactor volume and plasma production having high power efficiency. <P>SOLUTION: A grounding side electrode 3, a high-voltage side electrode 4 and a dielectric member 5 disposed between them are provided in the plasma reactor A, that is, a plasma processing chamber. The dielectric member 5 has a structure, in which a porous ceramic base material is covered with an inorganic dielectric material. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
