NEW POLYMERIZABLE MONOMER, PHOTOSENSITIVE COMPOSITION CONTAINING IT AND PLANOGRAPHIC PRINTING PLATE

摘要

PROBLEM TO BE SOLVED: To find out a new polymerizable monomer which is highly polymerizable and has high sensitivity, and to find out a photosensitive composition which is excellent in chemical resistance to a strong alkali or the like and does not need a postcure.

SOLUTION: The polymerizable monomer has two or more unit structures represented by general formula (1) in the molecular. The photosensitive composition contains the polymerizable monomer.

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